Patents

Patents are exclusive rights granted for an invention, an invention refers to a solution to a specific problem in the field of technology. It can be a new and useful art, process, machine, manufacture, or composition of matter. The invention should not be obvious and should have practical applications in trade or industry. It can also include any new and useful improvement on existing inventions. An invention may be related to a product or a process and encompasses alleged inventions that may require examination or verification. (Industrial Property Act, Act No.3 of 2001).

Application Number Title of the Invention Applicant Nationality Body Area of technology
KE/17/02715 (PCT/NL2016/050071) HYDROPOWER INSTALLATION PROGENESYS NETHERLANDS JURISTIC
KE/17/02716 (PCT/BE2016/000012) BARREL FOR CO2--CONTAINING DRINKS AND USE THEREOF CARDIFF GROUP, ... BELGIUM JURISTIC
2014/2058 POLYMER BONDED VAT DYES SICPA HOLDING SA SWITZERLAND JURISTIC C, C, G
2013/1806 METHOD FOR PRODUCING ARTICLES OF PLANT ORIGIN IMPREGNATED WITH A LIQUID PLANT... SCHWEITZER-MAUD... U.S.A JURISTIC A, C
KE/P/2015/2222 USE OF SURAMIN AND ARGINASE INHIBITORS IN MALIGNANT NEOPLASIA SAMMY OYOO OPIYO KENYA NATURAL
KE/P/2015/2223 USE OF PICOLINATES AND ARGINASE INHIBITORS IN MALARIA MANAGEMENT SAMMY OYOO OPIYO KENYA NATURAL
KE/P/2015/2324 SECURE METHOD AND DEVICES FOR NUMBERED OBFUSCATION CONSTATINE OCHI... KENYA NATURAL
KE/P/2016/2545 SPEED LIMITING CENTRIFUGAL GOVERNOR FOR AN ENGINE PROPELLED BY GRAVITY GREEN GRAVITY L... KENYA JURISTIC
KE/17/02718 (PCT/JP16/052696) INSECTICIDAL COMPOSITION AND INSECT PEST CONTROL METHOD ISHIHARA SANGYO... JAPAN JURISTIC
KE/17/02721 (PCT/ES2016/070065) ACID COMPOSITION BASED ON LEONARDITE AND AMINO ACIDS SIPCAM INAGRA, ... SPAIN JURISTIC
KE/17/02723 (PCT/SE2015/050357) CONFIGURATION OF LIVENESS CHECK TIMEOUT USING IKE MESSAGES TELEFONAKTIEBOL... SWEDEN JURISTIC
KE/17/02727 (PCT/CA2016/050262) ELECTROSTATIC ADHESION OF DRY POWDERS TO MACRO FERTILIZERS COMPASS MINERAL... CANADA JURISTIC
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Acknowledgement

We duly credit all content featured on this website to its original sources. We acknowledge and credit the Kenya Industrial Property Institute (KIPI) Journal as a source for IP registration information.