Patents

Patents are exclusive rights granted for an invention, an invention refers to a solution to a specific problem in the field of technology. It can be a new and useful art, process, machine, manufacture, or composition of matter. The invention should not be obvious and should have practical applications in trade or industry. It can also include any new and useful improvement on existing inventions. An invention may be related to a product or a process and encompasses alleged inventions that may require examination or verification. (Industrial Property Act, Act No.3 of 2001).

Application Number Title of the Invention Applicant Nationality Body Area of technology
KE/17/02669 (PCT/CN2015/080499) CHARGING CIRCUIT AND MOBILE TERMINAL GUANGDONG OPPO ... CHINA JURISTIC
KE/17/02673 (PCT/CN2015/080490) CHARGING CIRCUIT AND MOBILE TERMINAL GUANGDONG OPPO ... CHINA JURISTIC
KE/P/2015/2241 FEEDING DETERRENT BLEND COMPOSITION FOR POST HARVEST PESTS IN DRY STORED FOOD... MASINDE MULIRO ... KENYA JURISTIC A
2016/2459 A METHOD OF AND APPARATUS FOR PRINTING ON A WEB SICPA HOLDING SA SWITZERLAND JURISTIC B
2016/2529 A TAMPER-EVIDENT CLOSURE OBRIST CLOSURES... SWITZERLAND JURISTIC B
2012/1707 ANTIBODIES TO HUMAN GDF8 REGENERON PHARM... U.S.A JURISTIC A, A, C
2014/2054 METHODS AND ARRANGEMENTS FOR TRANSMITTING AND RECEIVING DOWNLINK CONTROL INFO... TELEFONAKTIEBOL... SWEDEN JURISTIC H, H
2016/2529 A TAMPER-EVIDENT CLOSURE OBRIST CLOSURES... SWITZERLAND JURISTIC B
KE/17/02690 (PCT/US2015/066756) 5-FLUORO-4-IMINO-3-(ALKYL/SUBSTITUTED ALKYL)-1-(ARYLSULFONYL)-3,4- DIHYDROPYR... ADAMA MAKHTESHI... U.S.A JURISTIC
KE/17/02701 (PCT/JP2012/075219) COMMUNICATION SYSTEM, METHOD AND APPARATUS NEC CORPORATION JAPAN JURISTIC
KE/17/02702 (PCT/JP2012/075219) COMMUNICATION SYSTEM, METHOD AND APPARATUS NEC CORPORATION JAPAN JURISTIC
KE/17/02703 (PCT/SE2015/050679) WIRELESS COMMUNICATIONS INVOLVING A FAST INITIAL LINK SETUP, FILS, DISCOVERY ... TELEFONAKTIEBOL... SWEDEN JURISTIC
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Acknowledgement

We duly credit all content featured on this website to its original sources. We acknowledge and credit the Kenya Industrial Property Institute (KIPI) Journal as a source for IP registration information.