Patents

Patents are exclusive rights granted for an invention, an invention refers to a solution to a specific problem in the field of technology. It can be a new and useful art, process, machine, manufacture, or composition of matter. The invention should not be obvious and should have practical applications in trade or industry. It can also include any new and useful improvement on existing inventions. An invention may be related to a product or a process and encompasses alleged inventions that may require examination or verification. (Industrial Property Act, Act No.3 of 2001).

Application Number Title of the Invention Applicant Nationality Body Area of technology
KE/P/2017/2594 FINGER-MOUNTED READING LIGHT WITH AUTOMATIC SHUT-OFF GATHECHA NAOMI ... KENYA NATURAL
KE/P/2017/2633 CATHA EDULIS BASED CONFECTIONERY HERBAL CHEWING GUM AND METHOD THEREOF SAMUEL MAORE IT... KENYA NATURAL
KE/P/2017/2634 AUTOMATED SMART SELF REGULATING BROODER WITH GSM CAPABILITY KIMANI GEORGE C... KENYA NATURAL
KE/P/2015/2387 BIO-STIMULANT COMPOSITION FOR IMPROVED PLANT GROWTH AND THE PROCESS OF PREPAR... EID PARRY (INDI... INDIA JURISTIC A
2012/1582 TRIAZOLOPYRIDINES BAYER INTELLECT... GERMANY JURISTIC C, A, A
2014/2112 CALL HANDOVER BETWEEN CELLULAR COMMUNICATION SYSTEM NODES THAT SUPPORT DIFFER... TELEFONAKTIEBOL... SWEDEN JURISTIC H, H
2014/2065 RECONSTITUTED CEREAL GRAIN MARS INCORPORATED U.S.A JURISTIC A, A, A, A, A, A
KE/18/02790 (PCT/EP2016/074151) SECURE DELIVERY SYSTEM, LOGGING MODULE AND ACCESS CONTROLLED CONTAINER SICPA HOLDING SA EUROPE JURISTIC
KE/18/02791 (PCT/EP2016/073746) SECURE REFILL SYSTEM SICPA HOLDING SA EUROPE JURISTIC
2012/1697 METHODS AND APPARATUS FOR MEASUREMENT CONFIGURATION SUPPORT TELEFONAKTIEBOL... SWEDEN JURISTIC H, H, H
KE/18/02851 (PCT/SE2016/050841) METHODS PROVIDING UL GRANTS INCLUDING TIME DOMAIN CONFIGURATION AND RELATED W... TELEFONAKTIEBOL... SWEDEN JURISTIC
KE/18/02883 (PCT/EP2016/074057) PYROLYSIS PROCESS AND PLASMA PYROLYSIS REACTOR FOR CARRYING OUT SAID PROCESS EME INTERNATION... EUROPE JURISTIC
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Acknowledgement

We duly credit all content featured on this website to its original sources. We acknowledge and credit the Kenya Industrial Property Institute (KIPI) Journal as a source for IP registration information.