Patents

Patents are exclusive rights granted for an invention, an invention refers to a solution to a specific problem in the field of technology. It can be a new and useful art, process, machine, manufacture, or composition of matter. The invention should not be obvious and should have practical applications in trade or industry. It can also include any new and useful improvement on existing inventions. An invention may be related to a product or a process and encompasses alleged inventions that may require examination or verification. (Industrial Property Act, Act No.3 of 2001).

Application Number Title of the Invention Applicant Nationality Body Area of technology
KE/16/02463 (PCT/CN2014/085369) FUNGICIDAL COMPOSITION AND THE USE THEREOF ROTAM AGROCHEM ... CHINA JURISTIC
KE/16/02464 (PCT/KR2011/005214) METHOD AND APPARATUS FOR ENCODING AND DECODING IMAGE THROUGH INTRA PREDICTION SAMSUNG ELECTRO... KOREA JURISTIC
KE/16/02590 (PCT/CN2015/074050) POWER ADAPTER AND TERMINAL GUANGDONG OPPO ... CHINA JURISTIC
2014/2110 FABRIC SOFTENER ACTIVE COMPOSITION EVONIK DEGUSSA ... GERMANY JURISTIC C
2013/1875 NOXIOUS INSECT-CONTROLLING NET, NOXIOUS INSECT-CONTROLLING METHOD AND METHOD ... SUMITOMO CHEMIC... JAPAN JURISTIC A, A, A
2015/2246 DISC TUMBLER CYLINDER LOCK AND KEY COMBINATION ABLOY OY FINLAND JURISTIC E
2015/2360 TAMPER EVIDENT CLOSURE OBRIST CLOSURES... SWITZERLAND JURISTIC B
2015/2300 ELECTROLYTE FOR AN ELECTROCHEMICAL BATTERY CELL AND BATTERY CELL CONTAINING T... ALEVO RESEARCH AG SWITZERLAND JURISTIC H
KE/P/2015/2241 FEEDING DETERRENT BLEND COMPOSITION FOR POST HARVEST PESTS IN DRY STORED FOOD... MASINDE MULIRO ... KENYA JURISTIC
KE/P/2015/2258 ANTIMICROBIAL AGENTS PRODUCED BY XENORHADBUS GRIFFINIAE STRAIN XN45 INTERNATIONAL C... KENYA JURISTIC A
KE/17/02599 (PCT/SE2015/050173) ESTABLISHMENT OF DUAL CONNECTIVITY TELEFONAKTIEBOL... SWEDEN JURISTIC
KE/17/02595 (PCT/EP2015/065413) HARD SURFACE CLEANING COMPOSITION UNILEVER PLC EUROPE JURISTIC
27 / 115
Acknowledgement

We duly credit all content featured on this website to its original sources. We acknowledge and credit the Kenya Industrial Property Institute (KIPI) Journal as a source for IP registration information.