Patents

Patents are exclusive rights granted for an invention, an invention refers to a solution to a specific problem in the field of technology. It can be a new and useful art, process, machine, manufacture, or composition of matter. The invention should not be obvious and should have practical applications in trade or industry. It can also include any new and useful improvement on existing inventions. An invention may be related to a product or a process and encompasses alleged inventions that may require examination or verification. (Industrial Property Act, Act No.3 of 2001).

Application Number Title of the Invention Applicant Nationality Body Area of technology
KE/16/02572 (PCT/EP2015/058969) AN AQUEOUS ALKALINE HAND DISHWASH LIQUID DETERGENT FORMULATION UNILEVER PLC EUROPE JURISTIC
2014/2118 TAMPER-EVIDENT CLOSURE WITH TEAR-OFF SEAL GUALA CLOSURES ... ITALY JURISTIC B
KE/P/2011/1329 VARIABLE HEIGHTS CLOTH LINE KENYA INDUSTRIA... KENYA JURISTIC AND NATURAL D
KE/P/2015/2258 ANTIMICROBIAL AGENTS PRODUCED BY XENORHADBUS GRIFFINIAE STRAIN XN45 INTERNATIONAL C... KENYA JURISTIC
KE/16/02576 (PCT/FR2015/051371) METHOD AND INSTALLATION FOR TREATING A MIXTURE OF WASTE, HAVING TWO COMPOSTIN... FINANCE DEVELOP... FRANCE JURISTIC
KE/16/02577 (PCT/FR2015/051372) MACHINE FOR SORTING A MIXTURE OF WASTE, AND ASSOCIATED SORTING METHOD FINANCE DEVELOP... FRANCE JURISTIC
KE/16/02578 (PCT/FR2015/051370) METHOD AND INSTALLATION FOR TREATING A WASTE MIXTURE, INCLUDING SEPARATION AN... FINANCE DEVELOP... FRANCE JURISTIC
KE/16/02582 (PCT/EP2015/060616) LINK CHAIN OF A MOVING WALKWAY OR AN ESCALATOR INVENTION AG EURPOE JURISTIC
2011/001255 METHOD OF IDENTIFYING DISEASE RISK FACTORS ZINFANDEL PHARM... U.S.A JURISTIC C
2011/1388 PYRIDAZINONE COMPOUNDS TAKEDA PHARMACE... JAPAN JURISTIC A, A
2011/1388 PYRIDAZINONE COMPOUNDS TAKEDA PHARMACE... JAPAN JURISTIC A, A
KE/P/2014/2030 TOPICAL COMPOSITION CONTAINING THERAPEUTIC AGENT HAIR RELATED PROBLEMS AND A ... WANJA HANNAH DA... KENYA NATURAL _
23 / 115
Acknowledgement

We duly credit all content featured on this website to its original sources. We acknowledge and credit the Kenya Industrial Property Institute (KIPI) Journal as a source for IP registration information.